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We have succeeded in forming a Ga-Sn-O (GTO) film for a thin-film transistor (TFT) using radio-frequency (RF) magnetron sputtering at room temperature without annealing process. The field-effect mobility is 0.48 cm2·V−1·s−1 and the threshold voltage is 2.22 V. This result suggests a possibility of rare-metal free amorphous metal-oxide semiconductors.
We have evaluated characteristics of Ga-Sn-O (GTO) thin films deposited by RF magnetron sputtering with changing composition ratios of sputtering targets and deposition pressure. The optical transmittance is more than 80%, and the sheet resistance decreases as the deposition pressure increase for the thin films for Ga∶Sn=1∶3, On the other hand, for the thin films for Ga∶Sn=3∶1, both the transmittance...
We are researching Ga-Sn-O (GTO) thin film as a potential material for future semiconductor devices. In this study, we investigate the GTO thin film using Hall measurement. A GTO film is deposited using RF magnetron sputtering, and annealed using electric-furnace annealing in air at temperature of 350 °C. We utilize van der Pauw method of the Hall measurement with slight modification, where the Hall...
Transparent In2O3 thin film semiconductor was evaluated for applications of thin film transistor (TFT) active channel layer. The film was deposited with RF magnetron sputtering using In2O3 powder target. The transmittance of the In2O3 film was higher than 80 %. The sheet resistance of the film could be controlled by the deposition condition. Therefore, the In2O3 thin film would be applicable for the...
Rare metal free SnO2 / Al2O3 thin film semiconductor was evaluated for applications of thin film transistor (TFT) active channel layer. The film was deposited with RF magnetron sputtering using mixed SnO2 / Al2O3 powder target. The transmittance of the SnO2 / Al2O3 film was higher than 80 %. The sheet resistance of the film could be controlled by the deposition condition. Therefore, the SnO2 / Al2...
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