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Controlled epitaxial growth of 4H‐SiC is essential for advancing both power electronics and quantum technologies. This study explores how different carbon sources—methane and propane—affect the surface morphology of these epitaxial layers. By varying C/Si ratios and using the two mentioned hydrocarbons as the carbon source in chloride‐based epitaxial growth of 4H‐SiC layers, it is unveiled that methane...
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