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We describe the science and technology of negative tone photolithography using polymethyl methacrylate (PMMA), photo-sensitised with the addition of the commercial photoinitiator – Irgacure 651. This versatile two-active-ingredient resist system is shown to enable negative tone photolithography which can be customised to application requirements by adjusting the ratio of the two ingredients. This...
Polymethyl methacrylate (PMMA) can be modified through the use of ultraviolet radiation and cross-linking agents to produce either topographic or refractive index structures. These techniques enable the fabrication of reflectors, gratings, photonic crystals and waveguides.
We describe a technique for photo-patterning polymethyl methacrylate (PMMA) resist films that does not use a wet development step. 254nm deep ultraviolet radiation from an ordinary mercury discharge lamp was used to both chain scission and remove PMMA in a single step lithographic process. PMMA films several microns thick can be patterned through this technique. The patterned film can also be directly...
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